Chemical vapor deposition is a nascent, single-step processing method for forming organic polymer films on unconventional substrates. Traditionally used in semiconductor and glass industries, Soliyarn’s innovation lies in adapting the benefits of CVD into flexible substrates like textile & soft materials. A suite of vapor-phase polymerization reactions performed inside reduced-pressure reactors, collectively termed CVD, is the enabling process we use to develop novel coatings on textiles.

CVD can be interpreted as a solvent-free synthetic technique, where multiple reagents converge in the vapor phase to effect a polymerization reaction. In CVD, polymer films are formed directly on the substrate of interest as vapors of a chemical agent and precursor (or monomer) are introduced into an evacuated reactor chamber simultaneously.