Reactive Vapor Deposition

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Reactive Vapor Deposition

A suite of vapor-phase polymerization reactions performed inside reduced-pressure hot wall reactors, collectively termed RVD, are the enabling methods we use to build novel devices. In RVD, polymer films are formed directly on the substrate of interest as vapors of a chemical agent and precursor (or monomer) are introduced into an evacuated reactor chamber simultaneously. This method allows for conformal coating of rough surfaces, with features resolvable down to 100-200 nm. The modularity of RVD ensures that careful monomer choice will lead to the in situ film growth of a host of functional polymers displaying varied properties

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